Semiconductor

UHP Gas for Semiconductor Fab

99.9995%+ nitrogen for wafer processing, oxidation, and packaging. Getter purifier for ppb-level O2 removal.

Critical Requirements

Semiconductor processes demand <1 ppb O2 and <1 ppb H2O. Standard PSA (99.999%) is insufficient without downstream purification.

Cleanroom Class 1-100 requires zero particle generation. All wetted surfaces must be electropolished 316L stainless steel.

Fab automation requires Modbus/Profinet communication. Continuous purity monitoring with alarm and auto-shutdown.

100-1,000 Nm3/h99.9999%+

PSA nitrogen + downstream getter purifier. Electropolished 316L construction. Class 1 cleanroom compatible.

50-500 Nm3/h99.999%

Catalytic deoxo for bulk N2 purification. Continuous online O2 analyzer.